Electrical generator or motor structure – Non-dynamoelectric – Charge accumulating
Reexamination Certificate
2006-08-08
2006-08-08
Tamai, Karl (Department: 2834)
Electrical generator or motor structure
Non-dynamoelectric
Charge accumulating
C438S052000
Reexamination Certificate
active
07088030
ABSTRACT:
A high-aspect-ratio-microstructure (HARM) is provided. The structure includes: a substrate; a lower structure with a comb shape fixedly mounted on said substrate and having first plural comb fingers, wherein each of the first plural comb fingers has a thin slot thereon; an upper structure with a comb shape having second plural comb fingers, wherein the lower structure and the upper structure have a height difference therebetween so as to form an uneven surface; and a lateral strengthening structure formed at vertically peripheral walls of the first plural comb fingers and the second plural comb fingers for protecting the plural first and second comb fingers.
REFERENCES:
patent: 5316979 (1994-05-01), MacDonald et al.
patent: 6149190 (2000-11-01), Galvin et al.
patent: 6151966 (2000-11-01), Sakai et al.
patent: 6276207 (2001-08-01), Sakai et al.
patent: 6450031 (2002-09-01), Sakai et al.
patent: 6497141 (2002-12-01), Turner et al.
patent: 6689694 (2004-02-01), Cho et al.
patent: 6925710 (2005-08-01), Scalf et al.
patent: 2001/0044165 (2001-11-01), Lee et al.
patent: 2003/0048036 (2003-03-01), Lemkin
patent: 2004/0097001 (2004-05-01), Hsieh et al.
patent: 2004/0232110 (2004-11-01), Hsieh et al.
patent: 2004/0232502 (2004-11-01), Hsieh et al.
patent: 09-055337 (1997-02-01), None
Chu Huai-Yuan
Fang Weileun
Hsieh Jerwei
Tsai Julius Ming-Lin
Tamai Karl
Volpe and Koenig PC
Walsin Lihwa Corporation
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