Coating apparatus – Gas or vapor deposition – With treating means
Patent
1997-07-11
1999-10-19
Chin, Peter
Coating apparatus
Gas or vapor deposition
With treating means
118723I, 118723E, 118723HC, 118723MP, 118724, 20429807, 20429809, 20429833, 422198, 422200, C23C 1600
Patent
active
059682760
ABSTRACT:
The present invention provides a method and apparatus for improving thermal management of gas being delivered to a chemical vapor deposition chamber. Thermal management is accomplished using a heat transfer fluid in thermal communication with the deposition gas passageways delivering the gases to the chamber for deposition. The gas injection manifold includes gas passageways and coolant liquid passageways, wherein the gas passageways extend through a constant voltage gradient gas feedthrough and the coolant liquid passageways extend through a gas input manifold coupled to the inlet end of the constant voltage gradient gas feedthrough. This arrangement provides for increase coolant liquid flow and allows maintenance or disassembly of the constant voltage gradient gas feedthrough without breaking the seal on the coolant liquid system.
REFERENCES:
patent: 4859304 (1989-08-01), Cathey et al.
patent: 5595606 (1997-01-01), Fujikawa et al.
patent: 5725675 (1998-03-01), Fong et al.
Johnson Mark
Lei Lawrence
Trinh Son
Applied Materials Inc.
Chin Peter
Colaianni Michael P.
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