Hardmask composition having antirelective properties and...

Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Forming nonplanar surface

Reexamination Certificate

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Details

C430S271100, C430S272100, C430S313000, C430S326000, C430S449000, C438S952000, C528S153000, C528S480000

Reexamination Certificate

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07981594

ABSTRACT:
A hardmask composition includes an organic solvent and one or more aromatic ring-containing polymers represented by Formula 1, 2 and 3:

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Machine generated English translation of KR 10-2006-0132070 published Dec. 21, 2006, translation generated from KIPO website on Mar. 22, 2010, 14 pages.
Machine generated English translation of KR 10-2007-0002591 published Jan. 5, 2007, translation generated from KIPO website on Mar. 22, 2010, 15 pages.
Machine generated English translation of KR 10-0713231 published Apr. 24, 2007, translation generated from KIPO website on Mar. 22, 2010, 29 pages.

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