Glue layer for hydrofluorocarbon etch

Details Glue layer for hydrofluorocarbon etch Glue layer for hydrofluorocarbon etch

2011-03-08

2011-03-08

Norton, Nadine G (Department: 1713)

Semiconductor device manufacturing: process

Chemical etching

Combined with coating step

C438S654000, C438S689000, C438S781000, C438S784000

Reexamination Certificate

active

07902073

ABSTRACT:
A method for etching features in an etch layer disposed below a mask on a process wafer is provided. A hydrocarbon based glue layer is deposited. The etch layer on the process wafer is etched with at least one cycle, wherein each cycle comprises depositing a hydrofluorocarbon layer over the mask and on the hydrocarbon based glue layer, wherein the hydrocarbon based glue layer increases adhesion of the hydrofluorocarbon layer and etching the etch layer.

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patent: 2005/0181598 (2005-08-01), Kailasam
patent: 2006/0130873 (2006-06-01), Richardson et al.
patent: 2006/0157448 (2006-07-01), Magni et al.

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