Computer-aided design and analysis of circuits and semiconductor – Nanotechnology related integrated circuit design
Reexamination Certificate
2006-01-31
2006-01-31
Smith, Matthew (Department: 2825)
Computer-aided design and analysis of circuits and semiconductor
Nanotechnology related integrated circuit design
C716S030000, C430S005000, C430S394000
Reexamination Certificate
active
06993741
ABSTRACT:
A method of generating patterns of a pair of photomasks from a data set defining a circuit layout to be provided on a substrate includes identifying critical segments of the circuit layout to be provided on the substrate. Block mask patterns are generated and then legalized based on the identified critical segments. Thereafter, phase mask patterns are generated, legalized and colored. The legalized block mask patterns and the legalized phase mask patterns that have been colored define features of a block mask and an alternating phase shift mask, respectively, for use in a dual exposure method for patterning features in a resist layer of a substrate.
REFERENCES:
patent: 5807649 (1998-09-01), Liebmann et al.
patent: 5883813 (1999-03-01), Kim et al.
patent: 6258493 (2001-07-01), Wang et al.
patent: 6338922 (2002-01-01), Liebmann et al.
patent: 6493866 (2002-12-01), Mayhew
patent: 6721938 (2004-04-01), Pierrat et al.
patent: 6733929 (2004-05-01), Pierrat
patent: 6823503 (2004-11-01), Beaudette
patent: 6846596 (2005-01-01), Wu
patent: 6904587 (2005-06-01), Tsai et al.
patent: 2001/0028985 (2001-10-01), Wang et al.
patent: 2002/0045136 (2002-04-01), Fritze et al.
patent: 2002/0046392 (2002-04-01), Ludwig et al.
patent: 2002/0071997 (2002-06-01), Ahrens et al.
patent: 2002/0081500 (2002-06-01), Cobb et al.
patent: 2002/0083410 (2002-06-01), Wu et al.
patent: 2002/0094492 (2002-06-01), Randall et al.
patent: 2003/0014732 (2003-01-01), Liu et al.
patent: 2003/0070155 (2003-04-01), Wu et al.
patent: 2003/0229879 (2003-12-01), Pierrat
patent: 2005/0081178 (2005-04-01), Sivakumar et al.
Sewell,H et al. “An Evaluation of the Dual Exposure Technique”, Proceedings of the SPIE—The International Society for Optical Engineering, vol. 4344, pp. 323-333, 2001.
Bukofsky Scott J.
Graur Ioana
Liebmann Lars W.
C. Li Todd M.
Dimyan Magid Y.
International Business Machines - Corporation
Smith Matthew
LandOfFree
Generating mask patterns for alternating phase-shift mask... does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Generating mask patterns for alternating phase-shift mask..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Generating mask patterns for alternating phase-shift mask... will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-3574818