Semiconductor device manufacturing: process – Making field effect device having pair of active regions... – Having insulated gate
Reexamination Certificate
2011-08-30
2011-08-30
Le, Thao X (Department: 2892)
Semiconductor device manufacturing: process
Making field effect device having pair of active regions...
Having insulated gate
C257S288000, C257S324000
Reexamination Certificate
active
08008155
ABSTRACT:
An electrode structure, e.g., a gate electrode for a transistor, includes: a volume of semiconductor material; a gate oxide on the semiconductor volume; a barrier layer, including silicon nitride, on the gate oxide layer; an adhesion layer on the barrier layer; and a metallic layer on the adhesion layer.
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Kim Yun-gi
Lee Kang-yoon
Seo Hyeoung-won
Yoon Jae-man
Harness & Dickey & Pierce P.L.C.
Ida Geoffrey
Le Thao X
Samsung Electronics Co,. Ltd.
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