Coating apparatus – Gas or vapor deposition – Multizone chamber
Reexamination Certificate
2005-07-05
2005-07-05
Hassanzadeh, Parviz (Department: 1763)
Coating apparatus
Gas or vapor deposition
Multizone chamber
C118S715000, C118S7230ER, C156S345260, C156S345290, C156S345310, C156S345320
Reexamination Certificate
active
06913652
ABSTRACT:
A system for processing substrates includes a first process chamber configured to perform a given process on a first substrate. A second process chamber is configured to perform the same process as the first chamber on a second substrate. A gas source system is configured to output a process gas. A gas flow system includes a flow channel coupled to the gas source system and the first and second process chambers to provide the process gas into the first and second process chambers. The gas source system further includes a gas flow controller to regulate flow rates of the process gas provided into the first and second chambers in order to provide the first and second substrates with substantially uniform process results.
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Applied Materials Inc.
Bach Joseph
Hassanzadeh Parviz
Moore Karla
Townsend & Townsend & Crew
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