Coating apparatus – Gas or vapor deposition
Reexamination Certificate
2007-01-30
2007-01-30
Lund, Jeffrie R. (Department: 1763)
Coating apparatus
Gas or vapor deposition
C156S345290, C156S345330
Reexamination Certificate
active
10318612
ABSTRACT:
An apparatus for providing different gases to different zones of a processing chamber is provided. A gas supply for providing an etching gas flow is provided. A flow splitter in fluid connection with the gas supply for splitting the etching gas flow from the gas supply into a plurality of legs is provided. A tuning gas system in fluid connection to at least one of the legs of the plurality of legs is provided.
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Denty, Jr. William M.
Kadkhodayan Babak
Larson Dean J.
Loewenhardt Peter
Su Xingcai
Beyer Weaver & Thomas LLP
Lam Research Corporation
Lund Jeffrie R.
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