Gas distribution system with tuning gas

Coating apparatus – Gas or vapor deposition

Reexamination Certificate

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Details

C156S345290, C156S345330

Reexamination Certificate

active

10318612

ABSTRACT:
An apparatus for providing different gases to different zones of a processing chamber is provided. A gas supply for providing an etching gas flow is provided. A flow splitter in fluid connection with the gas supply for splitting the etching gas flow from the gas supply into a plurality of legs is provided. A tuning gas system in fluid connection to at least one of the legs of the plurality of legs is provided.

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