Gas distribution showerhead featuring exhaust apertures

Details Gas distribution showerhead featuring exhaust apertures Gas distribution showerhead featuring exhaust apertures

2006-06-13

2008-11-18

Everhart, Caridad M (Department: 2895)

Semiconductor device manufacturing: process

Coating of substrate containing semiconductor region or of...

Insulative material deposited upon semiconductive substrate

C257SE21161, C257SE21170, C427S255230, C438S676000

Reexamination Certificate

active

07452827

ABSTRACT:
A method of processing a semiconductor workpiece. The method includes flowing a process gas to a semiconductor workpiece through a first plurality of orifices positioned in a gas distribution faceplate. The method also includes removing gas from over the semiconductor workpiece through a chamber exhaust port and a second plurality of orifices positioned in the gas distribution faceplate.

REFERENCES:
patent: 4209357 (1980-06-01), Gorin et al.
patent: 4579618 (1986-04-01), Celestino et al.
patent: 4590042 (1986-05-01), Drage
patent: 4793975 (1988-12-01), Drage
patent: 5422139 (1995-06-01), Fischer
patent: 5445699 (1995-08-01), Kamikawa et al.
patent: 5554226 (1996-09-01), Okase et al.
patent: 5614026 (1997-03-01), Williams
patent: 5781693 (1998-07-01), Ballance et al.
patent: 5789028 (1998-08-01), Zhao et al.
patent: 5976261 (1999-11-01), Mosle et al.
patent: 5976308 (1999-11-01), Fairbairn et al.
patent: 6050506 (2000-04-01), Guo et al.
patent: 6086677 (2000-07-01), Umotoy et al.
patent: 6090210 (2000-07-01), Ballance et al.
patent: 6444040 (2002-09-01), Herchen et al.
patent: 6537418 (2003-03-01), Muller et al.
patent: 6544341 (2003-04-01), Omstead et al.
patent: 6578515 (2003-06-01), Sakamoto et al.
patent: 6821563 (2004-11-01), Yudovsky
patent: 6821910 (2004-11-01), Adomaitis et al.
patent: 6852167 (2005-02-01), Ahn
patent: 6942753 (2005-09-01), Choi et al.
patent: 7270713 (2007-09-01), Blonigan et al.
patent: 2001/0016364 (2001-08-01), Loan et al.
patent: 2004/0099213 (2004-05-01), Adomaitis et al.
patent: 2004/0129211 (2004-07-01), Blonigan et al.
patent: 2004/0216668 (2004-11-01), Lindfors et al.
patent: 2005/0103265 (2005-05-01), Gianoulakis et al.
patent: 2005/0160983 (2005-07-01), Sneh
patent: 2005/0199182 (2005-09-01), Masuda et al.
patent: 2005/0208217 (2005-09-01), Shinriki et al.
patent: 2005/0229848 (2005-10-01), Shinriki et al.
patent: 2005/0279731 (2005-12-01), Saito et al.
patent: 2006/0234514 (2006-10-01), Gianoulakis et al.
patent: 410442 (1991-01-01), None
patent: WO 02/08487 (2002-01-01), None

Affiliated with

Also associated with

Rating

Gas distribution showerhead featuring exhaust apertures does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Gas distribution showerhead featuring exhaust apertures, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Gas distribution showerhead featuring exhaust apertures will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-4031719