Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Reexamination Certificate
2009-07-24
2011-10-04
Lee, Sin J. (Department: 1722)
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Radiation sensitive composition or product or process of making
C430S326000, C430S330000, C430S919000, C430S921000, C430S925000
Reexamination Certificate
active
08029975
ABSTRACT:
A resist composition and a method for forming a patterned feature on a substrate. The composition comprises a molecular glass having at least one fused polycyclic moiety and at least one base soluble functional group protected with an acid labile protecting group, and a photosensitive acid generator. The method includes providing a composition including a photosensitive acid generator and a molecular glass having at least one fused polycyclic moiety and at least one base soluble functional group protected with an acid labile protecting group, forming a film of the composition on the substrate, patternwise imaging the film, wherein at least one region of the film is exposed to radiation or a beam of particles, resulting in production of an acid catalyst in the exposed region, baking the film, developing the film, resulting in removal of base-soluble exposed regions, wherein a patterned feature from the film remains following the removal.
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Notice of Allowance (Mail Date Mar. 23, 2009) for Patent Application No. 11/769,089, filed Jun. 27, 2007.
Bucchignano James J.
Huang Wu-Song
Varanasi Pushkara R.
Yu Roy R.
International Business Machines - Corporation
Lee Sin J.
Petrokaitis Joseph
Schmeiser Olsen & Watts
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