Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Forming nonplanar surface
Reexamination Certificate
2005-03-01
2005-03-01
Duda, Kathleen (Department: 1756)
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Forming nonplanar surface
C430S323000, C430S325000, C430S331000
Reexamination Certificate
active
06861208
ABSTRACT:
A lithographic imaging method of the present invention includes the initial step of providing a substrate made from Mercury, Cadmium and Telluride materials (HgCdTe). The HgCdTe substrate is coated with a diazonaphthoquinone (DNQ) Novolak photoresist material to establish an imaging medium. The imaging medium is exposed to an image pattern and then developed in a tetra-methyl ammonium hydroxide (TMAH) solution. The TMAH solution includes a fullerene (C60) material dissolved therein to retard the subsequent etching of the imaging medium. The incorporation of fullerene into the photoresist material indirectly via the developing solution avoids the solubility and ultraviolet (UV) absorbance disadvantages inherent in adding fullerenes directly to the photoresist prior to placement on the substrate. After development, the imaging medium is etched to transfer the recorded image pattern to the substrate. The fullerene cooperates with the photoresist material to slow the etching process, which allows for a highly reticulated HgCdTe detectors and IR images having greatly enhanced resolution.
REFERENCES:
patent: 6395447 (2002-05-01), Ishii et al.
patent: 20020195600 (2002-12-01), Leuschner
Almeida Leo Anthony
Benson J. David
Boyd Phillip R.
Dinan John H.
Kaleczyc Andrew W.
Anderson William H.
Duda Kathleen
Samora Arthur K.
The United States of America as represented by the Secretary of
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