Forming tin thin films using remote activated specie generation

Details Forming tin thin films using remote activated specie generation Forming tin thin films using remote activated specie generation

1996-10-15

2000-06-06

Bueker, Richard

Coating processes

Direct application of electrical, magnetic, wave, or...

Plasma

118723ER, 118723IR, 118723MP, 427573, 427590, C23C 1600

Patent

active

060715723

ABSTRACT:
In a vapor deposition chamber which holds a substrate for processing, a method including the steps of forming a layer of material on the surface of the substrate, wherein the layer of material is made of Ti atoms; remotely activating a source gas containing nitrogen so as to produce activated nitrogen gas species; and while forming the layer of material on the substrate, injecting the activated nitrogen species into the processing chamber to increase the population of activated nitrogen species that is incorporated into the layer of material that is being formed.

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