Forming a transparent window in a polishing pad for a chemical m

Details Forming a transparent window in a polishing pad for a chemical m Forming a transparent window in a polishing pad for a chemical m

1999-02-26

2000-04-04

Banks, Derris Holt

Abrading

Flexible-member tool, per se

451 8, 451 6, 451 41, 451287, B24D 1100

Patent

active

060454393

ABSTRACT:
The polishing pad for a chemical mechanical polishing apparatus, and a method of making the same. The polishing pad has a covering layer with a polishing surface and a backing layer which is adjacent to the platen. A first opening in the covering layer with a first cross-sectional area and a second opening in the backing layer with a second, different cross-sectional area form an aperture through the polishing pad. A substantially transparent polyurethane plug is positioned in the aperture, and an adhesive material fixes the plug in the aperture.

REFERENCES:
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patent: 5394655 (1995-03-01), Allen et al.
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patent: 5605760 (1997-02-01), Roberts
patent: 5893796 (1999-04-01), Birang et al.

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