Forming a transparent window in a polishing pad for a...

Details Forming a transparent window in a polishing pad for a... Forming a transparent window in a polishing pad for a...

2006-03-14

2006-03-14

Wilson, Lee D (Department: 3723)

Abrading

Precision device or process - or with condition responsive...

By optical sensor

C451S526000, C451S285000

Reexamination Certificate

active

07011565

ABSTRACT:
The polishing pad for a chemical mechanical polishing apparatus, and a method of making the same. The polishing pad has a covering layer with a polishing surface and a backing layer which is adjacent to the platen. A first opening in the covering layer with a first cross-sectional area and a second opening in the backing layer with a second, different cross-sectional area form an aperture through the polishing pad. A substantially transparent polyurethane plug is positioned in the aperture, and an adhesive material fixes the plug in the aperture.

REFERENCES:
patent: 4037367 (1977-07-01), Kruse
patent: 4927485 (1990-05-01), Cheng et al.
patent: 5020283 (1991-06-01), Tuttle
patent: 5081796 (1992-01-01), Schultz
patent: 5177908 (1993-01-01), Tuttle
patent: 5196353 (1993-03-01), Sandhu et al.
patent: 5257478 (1993-11-01), Hyde
patent: 5297364 (1994-03-01), Tuttle
patent: 5329734 (1994-07-01), Yu
patent: 5394655 (1995-03-01), Allen et al.
patent: 5413651 (1995-05-01), Otruba
patent: 5413941 (1995-05-01), Koos et al.
patent: 5433651 (1995-07-01), Lustig et al.
patent: 5486129 (1996-01-01), Sandhu et al.
patent: 5489233 (1996-02-01), Cook et al.
patent: 5567503 (1996-10-01), Sexton et al.
patent: 5605760 (1997-02-01), Roberts
patent: 5609511 (1997-03-01), Moriyama et al.
patent: 5663797 (1997-09-01), Sandhu
patent: 5672091 (1997-09-01), Takahashi et al.
patent: 5791969 (1998-08-01), Lund
patent: 5838447 (1998-11-01), Hiyama et al.
patent: 5893796 (1999-04-01), Birang et al.
patent: 5910043 (1999-06-01), Manzonie et al.
patent: 5949927 (1999-09-01), Tang
patent: 5964643 (1999-10-01), Birang et al.
patent: 6045439 (2000-04-01), Birang et al.
patent: 6068539 (2000-05-01), Bajaj et al.
patent: 6146248 (2000-11-01), Jairath et al.
patent: 6159073 (2000-12-01), Wiswesser et al.
patent: 6171181 (2001-01-01), Roberts et al.
patent: 6179709 (2001-01-01), Redeker et al.
patent: 6190234 (2001-02-01), Swedek et al.
patent: 6224460 (2001-05-01), Dunton et al.
patent: 6247998 (2001-06-01), Wiswesser et al.
patent: 6248130 (2001-06-01), Perry
patent: 6280289 (2001-08-01), Wiswesser et al.
patent: 6280290 (2001-08-01), Birang et al.
patent: 6336841 (2002-01-01), Chang
patent: 6383058 (2002-05-01), Birang et al.
patent: 6524164 (2003-02-01), Tolles
patent: 6537133 (2003-03-01), Birang et al.
patent: 6676717 (2004-01-01), Birang
patent: 6719818 (2004-04-01), Birang
patent: 0 663 265 (1995-07-01), None
patent: 0 738 561 (1996-10-01), None
patent: 0 846 040 (1997-02-01), None
patent: 0881040 (1998-12-01), None
patent: 0881484 (1998-12-01), None
patent: 1075634 (1954-10-01), None
patent: 57-138575 (1982-08-01), None
patent: 58-004353 (1983-01-01), None
patent: 5817826 (1983-10-01), None
patent: 62190726 (1987-08-01), None
patent: 62-190728 (1987-08-01), None
patent: 62211927 (1987-09-01), None
patent: 2222533 (1990-09-01), None
patent: 3-234467 (1991-10-01), None
patent: 5138531 (1993-06-01), None
patent: 58-178526 (1993-10-01), None
patent: 5-309558 (1993-11-01), None
patent: 6037076 (1994-02-01), None
patent: 7-52032 (1995-02-01), None
patent: 9-36072 (1997-01-01), None
patent: WO93/20976 (1993-10-01), None
patent: WO 94/07110 (1994-03-01), None
Anonymous, Endpoint Detection of Oxide Polishing and Planarization of Semiconductor Devices, Research Disclosure No. 340, Kenneth Mason Publication, Ltd., Aug. 1992.
Rodel, “Glass Polishing Pad”, Jan. 1993.

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