Ferroelectric capacitor having three-dimensional structure,...

Active solid-state devices (e.g. – transistors – solid-state diode – Field effect device – Having insulated electrode

Reexamination Certificate

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C438S003000, C257S751000, C257S767000, C257SE29164, C257SE27104, C257SE21663, C257SE21664

Reexamination Certificate

active

07910967

ABSTRACT:
A ferroelectric capacitor having a three-dimensional structure, a nonvolatile memory device having the same, and a method of fabricating the same are provided. The ferroelectric capacitor may include a trench-type lower electrode, at least one layer formed around the lower electrode, a ferroelectric layer (PZT layer) formed on the lower electrode and the at least one layer and an upper electrode formed on the ferroelectric layer. The at least one layer may be at least one insulating interlayer and the at least one layer may also be at least one diffusion barrier layer. The at least one layer may be formed of an insulating material excluding SiO2or may have a perovskite crystal structure excluding Pb.

REFERENCES:
patent: 6284595 (2001-09-01), Kato
patent: 6642539 (2003-11-01), Ramesh et al.
patent: 6682969 (2004-01-01), Basceri et al.
patent: 7161793 (2007-01-01), Kurihara et al.
patent: 2002/0000598 (2002-01-01), Kang et al.
patent: 2005/0167725 (2005-08-01), Nagano et al.
patent: 2005/0205910 (2005-09-01), Kumura et al.
patent: 2006/0054948 (2006-03-01), Yamada
patent: 2006/0134808 (2006-06-01), Summerfelt et al.
patent: 1020000048374 (2000-07-01), None
Korean Office Action dated Sep. 28, 2006.

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