Etching a substrate: processes – Gas phase etching of substrate – Irradiating – ion implanting – alloying – diffusing – or...
Reexamination Certificate
2006-03-24
2008-10-21
Nadine, Norton (Department: 1792)
Etching a substrate: processes
Gas phase etching of substrate
Irradiating, ion implanting, alloying, diffusing, or...
C216S037000, C216S067000, C430S290000, C430S321000, C430S945000
Reexamination Certificate
active
07438824
ABSTRACT:
To make high quality long-range periodic nanostructures in a transparent or semi-transparent substrate, the transparent or semi-transparent substrate is scanned with a linearly polarized laser beam generated by a femtosecond laser and exceeding a predetermined energy/pulse threshold along a scanning path. Sub-diffraction limit structures are formed as periodic planes of modified material in the transparent or semi-transparent substrate extending along the scanning path. The modified material can then be chemically etched to form cavities.
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Corkum Paul
Hnatovsky Cyril
Rayner David
Simova Eli
Taylor Rod
(Marks & Clerk)
Angadi Maki
Mitchell Richard J.
Nadine Norton
National Research Council of Canada
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