Fabrication method with energy beam

Details Fabrication method with energy beam Fabrication method with energy beam

1996-03-18

1999-02-09

Powell, William

Etching a substrate: processes

Gas phase etching of substrate

Application of energy to the gaseous etchant or to the...

216 45, 216 63, 156345, B44C 122

Patent

active

058689524

ABSTRACT:
Three-dimensional ultra-fine micro-fabricated structures of the order of .mu.m and less are produced for use in advanced optical communication systems and quantum effect devices. The basic components are an energy beam source, a mask member and a specimen stage. Because the mask member is an independent component, various combinations of relative movements of the mask member with respect to the beam axis and/or workpiece can be made with high precision to produce curved or slanted surfaces on a workpiece, thereby producing a multiple lines or arrays of convex or concave micro-lenses. Other examples of fine-structures include deposition of thin films in a multiple line pattern or in an array pattern. Because of the flexibility of fabrication method and material of fabrication, labyrinth seals having curved surfaces with grooved structures can be used as friction reduction means for bearing components. Fine groove dimensions of the order of nm are possible. Energy beams can be any of fast atomic beams, ion beams, electron beam, laser beams, radiation beams, X-ray beams and radical particle beams. Parallel beams are often used, but when a focused beam is used, a technique of reduced projection imaging can be utilized to produce a fine-structure of the order of nm.

REFERENCES:
patent: 4136285 (1979-01-01), Anger et al.
patent: 4310743 (1982-01-01), Seliger
patent: 4513203 (1985-04-01), Bohlen et al.
patent: 4734152 (1988-03-01), Geis et al.
patent: 4757208 (1988-07-01), McKenna et al.
patent: 4810621 (1989-03-01), Akkapeddi et al.
patent: 4835392 (1989-05-01), Loschner et al.
patent: 5269882 (1993-12-01), Jacobsen
patent: 5350499 (1994-09-01), Shibaike et al.
patent: 5708267 (1998-01-01), Hatakeyama
patent: 5770123 (1998-06-01), Hatakeyama et al.
Becker, E.W. et al.: "Fabrication of Microstructures with High Aspect Ratios and Great Structural Heights by Synchrotron Radiation Lithography, Galvanoforming, and Plastic Moulding (LIGA Process)" Microelectronic Engineering, vol. 4, 1986, pp. 35-56, XP002016184 * the whole document*.
Fusao Shimokawa et al., "Reactive-fast-atom beam etching of GaAs using Cl.sub.2 gas", J. Appl. Phys. 66(6), 15 Sep. 1989, published by 1989 American Institute of Physics, 1989, pp. 2613-2618.
Tetsuro Nakamura et al., "Fabrication Technology of Integrated Circuit", published by Sangyo Tosho Publishing Company (Japan), 1987, pp. 21-23 (includes English translation).
Masayuki Nakao et al., "3-dimensional Handling in Nano Manufacturing World", Proceedings of 71st Fall annual meeting of the Japan Society of Mechanical Engineers, published by the Japan Society of Mechanical Engineers, 1993, vol. F, pp. 273-275 (includes English Abstract).
Masayuki Nakao et al., "Realization of 3-D Manufacturing in Nano Manufacturing World", Proceedings of 71st Spring annual meeting of the Japan Society of Mechanical Engineers, published by the Japan Society of Mechanical Engineers, 1993, vol. IV, pp. 485-486 (includes English Abstract).

Affiliated with

Also associated with

Rating

Fabrication method with energy beam does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Fabrication method with energy beam, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Fabrication method with energy beam will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-1946236