Photocopying – Projection printing and copying cameras – Illumination systems or details
Patent
1998-09-25
2000-02-29
Metjahic, Safet
Photocopying
Projection printing and copying cameras
Illumination systems or details
355 68, G03B 2754, G03B 2774
Patent
active
060315989
ABSTRACT:
An extreme ultraviolet lithography (EUVL) machine or system for producing integrated circuit (IC) components, such as transistors, formed on a substrate. The EUVL machine utilizes a laser plasma point source directed via an optical arrangement onto a mask or reticle which is reflected by a multiple mirror system onto the substrate or target. The EUVL machine operates in the 10-14 nm wavelength soft x-ray photon. Basically the EUV machine includes an evacuated source chamber, an evacuated main or project chamber interconnected by a transport tube arrangement, wherein a laser beam is directed into a plasma generator which produces an illumination beam which is directed by optics from the source chamber through the connecting tube, into the projection chamber, and onto the reticle or mask, from which a patterned beam is reflected by optics in a projection optics (PO) box mounted in the main or projection chamber onto the substrate. In one embodiment of a EUVL machine, nine optical components are utilized, with four of the optical components located in the PO box. The main or projection chamber includes vibration isolators for the PO box and a vibration isolator mounting for the substrate, with the main or projection chamber being mounted on a support structure and being isolated.
REFERENCES:
patent: 5298939 (1994-03-01), Swanson et al.
patent: 5559584 (1996-09-01), Miyaji et al.
Haney Steven J.
Kubiak Glenn D.
Sweeney Donald W.
Tichenor Daniel A.
Carnahan Lafayette E.
EUV LLC
Metjahic Safet
Nguyen Hung Henry
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