4. Adhesive bonding and miscellaneous chemical manufacture
  5. Delaminating processes adapted for specified product
  6. Delaminating in preparation for post processing recycling step

Glenn D. Kubiak

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Condenser for extreme-UV lithography with discharge source

X-ray or gamma ray systems or devices – Specific application – Diffraction – reflection – or scattering analysis
Reexamination Certificate

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Condenser optic with sacrificial reflective surface

Optical: systems and elements – Having significant infrared or ultraviolet property – Multilayer filter or multilayer reflector
Reexamination Certificate

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Condenser optic with sacrificial reflective surface

Optical: systems and elements – Having significant infrared or ultraviolet property – Multilayer filter or multilayer reflector
Reexamination Certificate

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Erosion resistant nozzles for laser plasma extreme ultraviolet (

Radiant energy – Ion generation – Field ionization type
Patent

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Extreme ultraviolet lithography machine

Photocopying – Projection printing and copying cameras – Illumination systems or details
Patent

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Profile ID: LFUS-PAI-P-714651

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