Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Electron beam imaging
Patent
1989-07-11
1992-10-20
Robinson, Ellis P.
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Electron beam imaging
430942, 430139, G03C 500
Patent
active
051569426
ABSTRACT:
An electron beam imaging system (10) includes a photoemitter plate (12). An optical image beam (15) is directed through a pattern mask (18), which is imaged onto the photoemitter (12). The photoemitter (12) emits electrons from those unmasked regions illuminated by the optical image beam, emitting an extended-source electron beam that carries the mask image. The extended-source electron beam is focused (34) onto a device under fabrication (40), providing a single-stage electron lithographic patterning function. The optical source (16) is chosen so that the optical image beam energy is nearly identical to the work function for the photoemissive coating (14) of the photoemitter (12). As a result, the photoemitter (12) emits electrons with substantially zero kinetic energy, allowing the emitted electrons to be accelerated through the electron beam focusing elements (34) with very nearly identical electron velocities, thereby minimizing chromatic aberrations. In one embodiment, an aperture (85) is used to limit the extended-source electron beam to those electrons with trajectories requiring no more than a maximum amount of focusing, thereby minimizing spherical aberrations.
REFERENCES:
patent: 4356254 (1982-10-01), Takahashi et al.
patent: 4425423 (1984-01-01), Wang
patent: 4438336 (1984-03-01), Riecke
patent: 4661709 (1987-04-01), Walker et al.
L. F. Thompson et al, Introduction to Microlithography, Mar. 20-25 1983, pp. 74-78.
R. Feder et al., Single Exposure System for Multilevel Metallurgy, Jan. 1975, vol. 17, No. 8, pp. 2460-2461.
Aton Thomas J.
Spicer Denis F.
Barndt B. Peter
Donaldson Richard L.
Matsil Ira S.
Robinson Ellis P.
Texas Instruments Incorporated
LandOfFree
Extended source E-beam mask imaging system and method does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Extended source E-beam mask imaging system and method, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Extended source E-beam mask imaging system and method will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-191237