Etching of silicon nitride

Details Etching of silicon nitride Etching of silicon nitride

1999-06-29

2000-05-23

Utech, Benjamin L.

Compositions

Etching or brightening compositions

Inorganic acid containing

252 794, 252 793, 438745, 438756, 438757, H01L 21302

Patent

active

060662670

ABSTRACT:
Silicon nitride is etched employing a composition containing a fluoride containing compound, certain organic solvents, and water.

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