Etching of silicon nitride

Details Etching of silicon nitride Etching of silicon nitride

1997-09-18

1999-10-12

Utech, Benjamin

Semiconductor device manufacturing: process

Chemical etching

Liquid phase etching

438757, 252 791, H01L 2102, H01L 21306

Patent

active

059654651

ABSTRACT:
Silicon nitride is etched employing a composition containing a fluoride containing compound, certain organic solvents, and water.

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