Etching method using a hardened PVA stencil

Details Etching method using a hardened PVA stencil Etching method using a hardened PVA stencil

1981-05-19

1982-07-13

Kimlin, Edward C.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Forming nonplanar surface

430 28, 430289, 430318, 430329, 1566591, 156904, C23F 102, G03C 500

Patent

active

043395287

ABSTRACT:
The method comprises producing on the surface to be etched a stencil of a light-hardened PVA. The stencil is produced by light hardening selected portions of a film or coating consisting essentially of dichromate-sensitized PVA. The PVA is about 85% to 97% hydrolyzed and has a molecular weight of 75,000 to 100,000. After light hardening, the nonhardened portions of the film are removed, thereby producing the stencil. The stencil is baked to improve its etch resistance, the surface is etched through the stencil, and then the stencil is removed from the surface.

REFERENCES:
patent: 3415648 (1968-12-01), Certa
patent: 3589907 (1971-06-01), Dijkstra
patent: 4061529 (1977-12-01), Goldman
patent: 4208242 (1980-06-01), Zampiello

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