Enhanced reliability of wafer-level chip-scale packaging...

Semiconductor device manufacturing: process – Chemical etching

Reexamination Certificate

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C438S462000, C438S113000, C438S114000, C438S115000, C438S464000, C257S786000, C257S737000, C257S738000, C257S778000, C257S784000, C257S780000, C257S790000, C257S791000, C257S730000

Reexamination Certificate

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07838424

ABSTRACT:
An improved Wafer-Level Chip-Scale Packaging (WLCSP) process is described that includes forming a plurality of conductive pillars on a first surface of a semiconductor wafer. One or more grooves are dry etched into the first surface of the semiconductor wafer, where the grooves define at least one boundary between each of a plurality of die within the semiconductor wafer. A layer of encapsulating material is deposited over the first surface. A recess is then cut in each of the grooves through the encapsulating material, where the cutting leaves a piece of semiconductor material on the second surface of the semiconductor wafer. The second surface is then ground to remove the piece of semiconductor material, where the removal of this material separates the plurality of die.

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