End point detection method, end point detection device, and...

Details End point detection method, end point detection device, and... End point detection method, end point detection device, and...

2006-08-22

2010-10-19

Gakh, Yelena G (Department: 1797)

Etching a substrate: processes

Gas phase etching of substrate

With measuring, testing, or inspecting

C216S058000, C216S059000, C438S037000, C438S043000, C438S055000, C438S149000, C156S345250

Reexamination Certificate

active

07815813

ABSTRACT:
An end point detection method in the case where a catalyst arranged in a treatment chamber of a gas phase reaction processing apparatus is heated at high temperature by supplying electric power thereto and the treatment is carried out by cracking a reaction gas by the catalyst heated at high temperature, comprises the steps of supplying the electric power to the catalyst from a constant current source, detecting electric potential difference between both ends of the catalyst, performing primary differentiation of the detected electric potential difference, and determining an end point of the treatment based on obtained primary differential value.

REFERENCES:
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patent: 6517669 (2003-02-01), Chapman
patent: 6592771 (2003-07-01), Yamanaka et al.
patent: 2000-294535 (2000-10-01), None
patent: 2000-294542 (2000-10-01), None
patent: 2003-007624 (2003-01-01), None
Elert, Glen “Electrical resistance.” [online] [retreived on Jan. 22, 2010]. Retreived from the internet:<URL:http://physics.info/electric-resistance/>.

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