4. Chemistry: electrical and wave energy
  5. Processes and products
  6. Coating, forming or etching by sputtering

Kazuhisa Takao

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End point detection method, end point detection device, and...

Etching a substrate: processes – Gas phase etching of substrate – With measuring – testing – or inspecting
Reexamination Certificate

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Method of and apparatus for processing a workpiece in plasma

Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering
Patent

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Profile ID: LFUS-PAI-P-1395347

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