Semiconductor device manufacturing: process – Making device or circuit responsive to nonelectrical signal – Thermally responsive
Reexamination Certificate
2006-12-26
2006-12-26
Whitehead, Jr., Carl (Department: 2813)
Semiconductor device manufacturing: process
Making device or circuit responsive to nonelectrical signal
Thermally responsive
Reexamination Certificate
active
07153717
ABSTRACT:
This invention comprises a process for fabricating a MEMS microstructure in a sealed cavity wherein the etchant entry holes are created as a by-product of the fabrication process without an additional step to etch holes in the cap layer. The process involves extending the layers of sacrificial material past the horizontal boundaries of the cap layer. The cap layer is supported by pillars formed by a deposition in holes etched through the sacrificial layers, and the etchant entry holes are formed when the excess sacrificial material is etched away, leaving voids between the pillars supporting the cap.
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patent: 5683591 (1997-11-01), Offenberg
patent: 5834333 (1998-11-01), Seefeldt et al.
patent: 6323982 (2001-11-01), Hornbeck
patent: 6441451 (2002-08-01), Ikeda et al.
patent: 2004/0036133 (2004-02-01), Rodgers
Carley L. Richard
Santhanam Suresh
Yu-Nu Hsu
Greenberg & Traurig, LLP
Harrison Monica D
IC Mechanics Inc.
Jr. Carl Whitehead
Lappin Mark G.
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