Electricity: electrical systems and devices – Electric charge generating or conducting means – Use of forces of electric charge or field
Patent
1998-09-30
2000-09-26
Sherry, Michael J.
Electricity: electrical systems and devices
Electric charge generating or conducting means
Use of forces of electric charge or field
279128, H01T 2300
Patent
active
061250252
ABSTRACT:
A glass workpiece processed in a vacuum plasma processing chamber is dechucked from a monopolar electrostatic chuck by gradually reducing the chucking voltage during processing while maintaining the voltage high enough to clamp the workpiece. The chucking voltage during processing is controlled in response to flow rate of a heat transfer fluid flowing to the chuck to maintain the chucking force and the flow rate approximately constant. A reverse polarity voltage applied to the chuck at the end of processing assists in dechucking. The workpiece temperature is maintained at a high value at the end of processing to assisting in dechucking. Peak current flowing through the chuck during workpiece lifting from the chuck controls the amplitude and/or duration of the reverse polarity voltage during the next dechucking operation. An inert plasma in the chamber removes residual charge from the workpiece after workpiece lifting from the chuck.
REFERENCES:
patent: 5221450 (1993-06-01), Hattori
patent: 5325261 (1994-06-01), Horwitz
patent: 5444597 (1995-08-01), Blake et al.
patent: 5463525 (1995-10-01), Barnes et al.
patent: 5474614 (1995-12-01), Robbins
patent: 5507874 (1996-04-01), Su et al.
patent: 5557215 (1996-09-01), Saeki et al.
patent: 5573981 (1996-11-01), Sato
patent: 5699223 (1997-12-01), Mashiro et al.
patent: 5708250 (1998-01-01), Benjamin et al.
patent: 5737177 (1998-04-01), Mett et al.
patent: 5764471 (1998-06-01), Burkhart
patent: 5793192 (1998-08-01), Kubly et al.
patent: 5818682 (1998-10-01), Loo
patent: 5838528 (1998-11-01), Os et al.
patent: 5847918 (1998-12-01), Shufflebotham et al.
patent: 5880924 (1999-03-01), Kumar et al.
patent: 5894400 (1999-04-01), Graven et al.
patent: 5933314 (1999-08-01), Lambson et al.
patent: 5956837 (1999-09-01), Shiota et al.
Holland John P.
Howald Arthur M.
Lam Research Corporation
Sherry Michael J.
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