Electricity: electrical systems and devices – Electric charge generating or conducting means – Use of forces of electric charge or field
Patent
1995-03-24
1998-10-13
Fleming, Fritz
Electricity: electrical systems and devices
Electric charge generating or conducting means
Use of forces of electric charge or field
279128, H02N 1300
Patent
active
058221719
ABSTRACT:
An electrostatic chuck (20) for holding a substrate (45) is described. One version of the chuck (20) suitable for mounting on a base (25), comprises (i) an electrostatic member (33) having an electrode (50) therein, and (ii) an electrical lead (60) extending through the base (25) to electrically engage the electrode (50) of the electrostatic member (33). When the chuck (20) is used to hold a substrate (45) in a process chamber (80) containing erosive process gas, the substrate (45) covers and substantially protects the electrical lead (60) from erosion by the erosive process gas. In a preferred version of the chuck (20), an electrical connector (55) forming an integral extension of the electrode (50), electrically connects the electrode (50) to a voltage supply terminal (70) used to operate the chuck (20). The electrical connector (55) comprises (i) an electrical lead (60) that extends through the base (25), and (ii) an electrical contact (65) on the electrical lead (60), the contact sized sufficiently large to directly contact and electrically engage the voltage supply terminal (70). The electrode (50) of the chuck (20) can comprise first and second electrodes (130), (135) electrically isolated from one another by an electrical isolation void (52), the electrodes sized and configured so that the electrical isolation void (52) can serve as a cooling groove (105) for holding coolant for cooling the substrate (45) held on the chuck (20). Preferably, the two electrode chuck (20) is used in conjunction with a switching system capable of operating the chuck (20) in either a monopolar mode or in a bipolar mode. Erosion resistance of the chuck (20) is further enhanced by a masking gas assembly (115) which directs a masking gas at an exposed portion of the insulator (35), to protect the exposed portion of the insulator (35) from the erosive gas contained in the process chamber (80).
REFERENCES:
patent: 3983401 (1976-09-01), Livesay
patent: 3993509 (1976-11-01), McGinty
patent: 4520421 (1985-05-01), Sakitani et al.
patent: 4667110 (1987-05-01), Kariya
patent: 4724510 (1988-02-01), Wicker et al.
patent: 4968374 (1990-11-01), Tsukada et al.
patent: 5049421 (1991-09-01), Kosh
patent: 5094885 (1992-03-01), Selbrede
patent: 5155652 (1992-10-01), Logan et al.
patent: 5160152 (1992-11-01), Toraguchi et al.
patent: 5191506 (1993-03-01), Logan et al.
patent: 5207437 (1993-05-01), Barnes et al.
patent: 5221403 (1993-06-01), Nozawa et al.
patent: 5221450 (1993-06-01), Hattori et al.
patent: 5238499 (1993-08-01), Van De Ven et al.
patent: 5250137 (1993-10-01), Arami et al.
patent: 5255153 (1993-10-01), Nozawa et al.
patent: 5270266 (1993-12-01), Hirano et al.
patent: 5275683 (1994-01-01), Arami et al.
patent: 5311452 (1994-05-01), Yokota et al.
patent: 5348497 (1994-09-01), Nitescu
patent: 5415728 (1995-05-01), Hasegawa et al.
patent: 5460684 (1995-10-01), Saeki et al.
patent: 5478429 (1995-12-01), Komino et al.
patent: 5484485 (1996-01-01), Chapman
patent: 5507874 (1996-04-01), Su et al.
patent: 5528451 (1996-06-01), Su
patent: 5529657 (1996-06-01), Ishii
patent: 5691876 (1997-11-01), Chen et al.
patent: 5708557 (1998-01-01), Feigenbaum et al.
"Double-sided Electrostatic Chuck," IBM Technical Disclosure Bulletin, vol. 32, No. 5B, Oct. 1989.
European Search Report, application No. 95305850.0, dated Jul. 10, 1996.
European Search Report, application No. 95305847, dated Dec. 22, 1995.
European Search Report, application No. 95305850, dated Dec. 28, 1995.
U.S. application No. 08/052,018, filed Apr. 22, 1993.
U.S. application No. 08/199,402, filed Feb. 22, 1994.
U.S. application No. 08/199,916, filed Feb. 22, 1994.
U.S. application No. 08/278,787, filed Jul. 19, 1994.
U.S. application No. 08/439,010, filed May 11, 1995.
U.S. application No. 08/439,011, filed May 11, 1995.
Watanabe, T., et al., "Electrostatic Force and Absorption Current of Alumina Electrostatic Chuck," Jpn. J. Appl. Phys., vol. 31 (1992) Pt. 1, No. 7 (pp. 2145-2150).
Nakasuji, M., et al., "Low Voltage and High Speed Operating Electrostatic Wafer Chuck," J. Vac. Sci. Technol. A., 10(6):3573-3578, Nov./Dec. 1992.
Communication, European Search Report, Application No. EP 95 30 0811.7, dated 24 May 1995.
Birang Manoocher
Cameron John F.
Deshpandey Chandra
Goldspiel Alfred
Northrup Ron
Applied Materials Inc.
Fleming Fritz
Janah Ashok K.
Sgarbossa Peter J.
LandOfFree
Electrostatic chuck with improved erosion resistance does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Electrostatic chuck with improved erosion resistance, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Electrostatic chuck with improved erosion resistance will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-319551