Electrostatic chuck having a combination electrode structure for

Electricity: electrical systems and devices – Electric charge generating or conducting means – Use of forces of electric charge or field

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279128, H02N 1300

Patent

active

058868666

ABSTRACT:
An electrostatic chuck including a body of ceramic material, a pair of electrodes embedded in the body of ceramic material, and two feedthroughs connected to each of the electrodes for receiving DC chucking voltage, RF biasing power, and electric heating current. The electrode structure simultaneously provides biasing, chucking and heating of a wafer that is retained by the chuck.

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