Electrostatic chuck device

Electricity: electrical systems and devices – Electric charge generating or conducting means – Use of forces of electric charge or field

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Details

269 8, 269903, 279128, H02N 1300

Patent

active

051794985

ABSTRACT:
The present invention provides an electrostatic chuck device with a strong chucking force for use in an ion injection apparatus, an etching apparatus, a sputtering apparatus, an CVD apparatus, etc., which require electrostatic chucking. The chuck device is capable of easily loading/unloading an object to be chucked and providing sure grounding for a semiconductor wafer. To this purpose, three-phase AC voltages of 1 Hz or less with different phases are applied, and contact pins with pointed tips are provided.

REFERENCES:
patent: 4558334 (1985-12-01), Fotland
patent: 4692836 (1987-09-01), Suzuki
patent: 4751609 (1988-06-01), Kasahara
patent: 5001594 (1991-03-01), Bobbio

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