Dyed photoresists and methods and articles of manufacture compri

Details Dyed photoresists and methods and articles of manufacture compri Dyed photoresists and methods and articles of manufacture compri

1998-01-15

1999-11-02

Baxter, Janet

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Forming nonplanar surface

4302701, 430926, G03C 500

Patent

active

059767707

ABSTRACT:
The present invention provides new photoresist compositions that comprise a resin binder, a photoactive component, particularly an acid generator, and a low molecular weight anthracene dye compounds. It has been found that these dye compounds can significantly reduce or even eliminate undesired reflections of exposure radiation, particularly deep U.V. exposure radiation such as 248 nm, as well as function as effective sensitizer compounds, enabling effective imaging at higher wavelengths, particularly I-line exposures.

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patent: 5851730 (1998-12-01), Thackeray et al.
patent: 5851738 (1998-12-01), Thackeray et al.

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