Dielectric layer for semiconductor device and method of...

Details Dielectric layer for semiconductor device and method of... Dielectric layer for semiconductor device and method of...

2008-05-13

2008-05-13

Pham, Thanhha S. (Department: 2813)

Semiconductor device manufacturing: process

Making field effect device having pair of active regions...

Having insulated gate

C438S240000, C438S287000, C438S763000, C257SE21009, C257SE21010

Reexamination Certificate

active

11027256

ABSTRACT:
A semiconductor device comprises a silicate interface layer and a high-k dielectric layer overlying the silicate interface layer. The high-k dielectric layer comprises metal alloy oxides.

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