Dielectric layer for semiconductor device and method of...

Details Dielectric layer for semiconductor device and method of... Dielectric layer for semiconductor device and method of...

2011-03-08

2011-03-08

Pham, Thanhha (Department: 2894)

Semiconductor device manufacturing: process

Making field effect device having pair of active regions...

Having insulated gate

C438S257000, C438S591000, C438S593000, C257SE21179

Reexamination Certificate

active

07902019

ABSTRACT:
A semiconductor device comprises a silicate interface layer and a high-k dielectric layer overlying the silicate interface layer. The high-k dielectric layer comprises metal alloy oxides.

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