Coating apparatus – Gas or vapor deposition
Reexamination Certificate
2006-12-12
2006-12-12
Lund, Jeffrie R. (Department: 1763)
Coating apparatus
Gas or vapor deposition
C118S724000, C156S345330, C156S345370
Reexamination Certificate
active
07147718
ABSTRACT:
The invention relates to a device and method for the deposition of in particular, crystalline layers on one or several, in particular, equally crystalline substrates in a process chamber, by means of reaction gases which are fed to the process chamber where they react pyrolytically. The process chamber has a first wall and a second wall, lying opposite the first. The first wall is provided with at least one heated substrate holder, to which at least one reaction gas is led by means of a gas inlet device. According to the invention, a premature decomposition of source gases and a local oversaturation of the gas flow with decomposition products may be avoided, whereby the gas inlet device is liquid cooled.
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Jürgensen Holger
Käppeler Johannes
Strauch Gerhard Karl
Aixtron AG
Lund Jeffrie R.
St. Onge Steward Johnston & Reens LLC
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