Device and method for the deposition of, in particular,...

Coating apparatus – Gas or vapor deposition

Reexamination Certificate

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Details

C118S724000, C156S345330, C156S345370

Reexamination Certificate

active

07147718

ABSTRACT:
The invention relates to a device and method for the deposition of in particular, crystalline layers on one or several, in particular, equally crystalline substrates in a process chamber, by means of reaction gases which are fed to the process chamber where they react pyrolytically. The process chamber has a first wall and a second wall, lying opposite the first. The first wall is provided with at least one heated substrate holder, to which at least one reaction gas is led by means of a gas inlet device. According to the invention, a premature decomposition of source gases and a local oversaturation of the gas flow with decomposition products may be avoided, whereby the gas inlet device is liquid cooled.

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