Coating apparatus
Gas or vapor deposition
Inventor
active
CVD coating device
CVD reactor
CVD reactor with RF-heated process chamber
CVD reactor with substrate holder which is rotatably driven...
Device and method for the deposition of, in particular,...
No associations
LandOfFree
Johannes Käppeler does not yet have a rating. At this time, there are no reviews or comments for this inventor.
If you have personal experience with Johannes Käppeler, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Johannes Käppeler will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-P-2136866