4. Coating apparatus
  5. Gas or vapor deposition
  6. Work support

Aixtron AG

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Arrangement comprising a support body and a substrate holder...

Coating apparatus – Gas or vapor deposition – Work support
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Chemical vapor deposition reactor and process chamber for...

Coating apparatus – Gas or vapor deposition – Multizone chamber
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Coating method

Coating processes – Coating by vapor – gas – or smoke
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CVD coating device

Coating apparatus – Gas or vapor deposition – Work support
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CVD reactor comprising a photodiode array

Coating apparatus – Gas or vapor deposition
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Profile ID: LFUS-PAI-P-2018384

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