Deposition methods utilizing microwave excitation

Details Deposition methods utilizing microwave excitation Deposition methods utilizing microwave excitation

2008-09-09

2008-09-09

Hoang, Quoc D (Department: 2892)

Semiconductor device manufacturing: process

Radiation or energy treatment modifying properties of...

C118S72300R

Reexamination Certificate

active

11519430

ABSTRACT:
The invention includes a deposition apparatus having a reaction chamber, and a microwave source external to the chamber. The microwave source is configured to direct microwave radiation toward the chamber. The chamber includes a window through which microwave radiation from the microwave source can pass into the chamber. The invention also includes deposition methods (such as CVD or ALD methods) in which microwave radiation is utilized to activate at least one component within a reaction chamber during deposition of a material over a substrate within the reaction chamber.

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