Coating processes – Direct application of electrical – magnetic – wave – or... – Plasma
Reexamination Certificate
2005-09-20
2005-09-20
Mills, Gregory (Department: 1763)
Coating processes
Direct application of electrical, magnetic, wave, or...
Plasma
C118S7230ER
Reexamination Certificate
active
06946167
ABSTRACT:
For enhancing plasma uniformity and long-term stability so as to readily form a film with excellent uniformity of thickness and quality and with good repeatability and for suppressing occurrence of image defects and drastically increasing the yield to form a deposited film ready for volume production, particularly, a functional deposit film (for example, an amorphous semiconductor used for semiconductor devices, electrophotographic photosensitive members, photovoltaic devices, and so on) is formed in an apparatus including a reaction vessel which can be hermetically evacuated, a substrate holder in the reaction vessel, a source gas supply, a power supply for high-frequency power. An end covering member is provided at an end of each of the substrate holder, the source gas supply and the power supply.
REFERENCES:
patent: 4867859 (1989-09-01), Harada et al.
patent: 5522936 (1996-06-01), Tamura
patent: 5534070 (1996-07-01), Okamura et al.
patent: 5540781 (1996-07-01), Yamagami et al.
patent: 5556500 (1996-09-01), Hasegawa et al.
patent: 5651867 (1997-07-01), Kokaku et al.
patent: 5688330 (1997-11-01), Ohmi
patent: 5919332 (1999-07-01), Koshiishi et al.
patent: 5958265 (1999-09-01), Ogahara
patent: 5970907 (1999-10-01), Takai et al.
patent: 6098568 (2000-08-01), Raoux et al.
patent: 01-047019 (1989-02-01), None
Akiyama Kazuyoshi
Hosoi Kazuto
Murayama Hitoshi
Okamura Ryuji
Shirasuna Toshiyasu
Canon Kabushiki Kaisha
Crowell Michelle
Fitzpatrick ,Cella, Harper & Scinto
Mills Gregory
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