Deposited film forming apparatus and deposited film forming...

Details Deposited film forming apparatus and deposited film forming... Deposited film forming apparatus and deposited film forming...

2005-09-20

2005-09-20

Mills, Gregory (Department: 1763)

Coating processes

Direct application of electrical, magnetic, wave, or...

Plasma

C118S7230ER

Reexamination Certificate

active

06946167

ABSTRACT:
For enhancing plasma uniformity and long-term stability so as to readily form a film with excellent uniformity of thickness and quality and with good repeatability and for suppressing occurrence of image defects and drastically increasing the yield to form a deposited film ready for volume production, particularly, a functional deposit film (for example, an amorphous semiconductor used for semiconductor devices, electrophotographic photosensitive members, photovoltaic devices, and so on) is formed in an apparatus including a reaction vessel which can be hermetically evacuated, a substrate holder in the reaction vessel, a source gas supply, a power supply for high-frequency power. An end covering member is provided at an end of each of the substrate holder, the source gas supply and the power supply.

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