Conjugated ICP and ECR plasma sources for wide ribbon ion...

Details Conjugated ICP and ECR plasma sources for wide ribbon ion... Conjugated ICP and ECR plasma sources for wide ribbon ion...

2011-08-16

2011-08-16

Wells, Nikita (Department: 2881)

Electric lamp and discharge devices: systems

Discharge device load with fluent material supply to the...

Plasma generating

C315S111210, C315S111810

Reexamination Certificate

active

07999479

ABSTRACT:
An ion source, capable of generating high-density wide ribbon ion beam, utilizing one or more plasma sources is disclosed. In addition to the plasma source(s), the ion source also includes a diffusion chamber. The diffusion chamber has an extraction aperture oriented along the same axis as the dielectric cylinder of the plasma source. In one embodiment, dual plasma sources, located on opposing ends of the diffusion chamber are used to create a more uniform extracted ion beam. In a further embodiment, a multicusp magnetic field is used to further improve the uniformity of the extracted ion beam.

REFERENCES:
patent: 6010755 (2000-01-01), Suzuki
patent: 6225745 (2001-05-01), Srivastava
patent: 6332947 (2001-12-01), Ichimura et al.
patent: 6863021 (2005-03-01), Sneh
patent: 2003/0015965 (2003-01-01), Godyak
patent: 2010/0055345 (2010-03-01), Biloiu et al.

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