Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Forming nonplanar surface
Reexamination Certificate
2006-11-16
2010-02-02
Hamilton, Cynthia (Department: 1795)
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Forming nonplanar surface
C430S313000, C430S271100, C430S272100, C430S280100
Reexamination Certificate
active
07655389
ABSTRACT:
A composition for forming a photosensitive organic anti-reflective layer includes about 0.5 to about 5 percent by weight of an acid-labile thermal cross-linking agent that is decomposed by an epoxy group and a photo-acid generator, about 10 to about 22 percent by weight of a copolymer resin that includes an acrylate monomer containing anthracene or a methacrylate monomer containing anthracene, about 0.1 to about 1 percent by weight of a photo-acid generator, and a solvent.
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Cha Sang-Ho
Huh Geun
Kwon Ki-Ok
Lee Jong-Chan
Yoon Sang-Woong
Hamilton Cynthia
Samsung Electronics Co,. Ltd.
Seoul National University Industry Foundation
Volentine & Whitt PLLC
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