Composition containing a photoacid generator monomer,...

Details Composition containing a photoacid generator monomer,... Composition containing a photoacid generator monomer,...

2011-03-08

2011-03-08

Chu, John S (Department: 1722)

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Forming nonplanar surface

C430S914000, C430S926000, C562S113000, C564S082000

Reexamination Certificate

active

07901871

ABSTRACT:
A composition containing a photoacid generator monomer and surfactant, and a method for synthesizing a compound on a substrate using the composition are provided. The method includes bonding a layer of first molecules having an acid labile protecting group to a solid substrate; coating a layer of the photoacid generator monomer composition according to the present invention on the layer of first molecules; exposing the composition layer to light and then heat-treating to remove the acid labile protecting group from the first molecules corresponding to the exposed portion; washing and removing the composition layer from the exposed and unexposed portions; and bonding second molecules to the exposed first molecules.

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patent: WO 03007079 (2003-01-01), None

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