Comparator mask for aperture measuring apparatus

Details Comparator mask for aperture measuring apparatus Comparator mask for aperture measuring apparatus

1980-06-09

1982-09-14

Punter, William H.

Optics: measuring and testing

By configuration comparison

With comparison to master, desired shape, or reference voltage

250237R, 356384, G01B 1102, G01B 334

Patent

active

043492789

ABSTRACT:
A comparator mask for use in apparatus for measuring aperture size of apertured material includes a light transparent section and at least one other section having alternate light transparent and opaque sectors whereby the comparator mask overlays the apertured material to provide an area of light transmission utilized to determine the dimensions of the aperture of the apertured material.

REFERENCES:
patent: 2532964 (1950-12-01), Taylor et al.
patent: 2657611 (1953-11-01), Borth
patent: 3906239 (1975-09-01), Smith et al.
patent: 4172553 (1979-10-01), Feather et al.
Ragland, Jr., F. W., "Method of Measuring The Width of Apertures in a PI Shadow Mask", RCA Tech. Notes, TN NO:1231, Mailing Date 9-6-79.

Affiliated with

Also associated with

Rating

Comparator mask for aperture measuring apparatus does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Comparator mask for aperture measuring apparatus, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Comparator mask for aperture measuring apparatus will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-2153014