Cleaning of native oxide with hydrogen-containing radicals

Details Cleaning of native oxide with hydrogen-containing radicals Cleaning of native oxide with hydrogen-containing radicals

2004-02-12

2009-10-20

Hassanzadeh, Parviz (Department: 1792)

Adhesive bonding and miscellaneous chemical manufacture

Differential fluid etching apparatus

With plasma generation means remote from processing chamber

C156S345330, C118S715000, C118S7230ME, C118S7230ER, C118S7230IR

Reexamination Certificate

active

07604708

ABSTRACT:
A substrate cleaning apparatus has a remote source to remotely energize a hydrogen-containing gas to form an energized gas having a first ratio of ionic hydrogen-containing species to radical hydrogen-containing species. The apparatus has a process chamber with a substrate support, an ion filter to filter the remotely energized gas to form a filtered energized gas having a second ratio of ionic hydrogen-containing species to radical hydrogen-containing species, the second ratio being different than the first ratio, and a gas distributor to introduce the filtered energized gas into the chamber.

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