Gas and liquid contact apparatus – Contact devices – Porous sheet
Reexamination Certificate
2006-07-31
2008-12-30
Bushey, Scott (Department: 1797)
Gas and liquid contact apparatus
Contact devices
Porous sheet
C261S105000, C261SDIG070
Reexamination Certificate
active
07469883
ABSTRACT:
The present invention is a novel cleaning method and a solution for use in a single wafer cleaning process. According to the present invention the cleaning solution comprises ammonium hydroxide (NH4OH), hydrogen peroxide (H2O2), water (H2O) and a chelating agent. In an embodiment of the present invention the cleaning solution also contains a surfactant. And still yet another embodiment of the present invention the cleaning solution also comprises a dissolved gas such as H2. In a particular embodiment of the present invention, this solution is used by spraying or dispensing it on a spinning wafer.
REFERENCES:
patent: 3045702 (1962-07-01), Nakata
patent: 3291347 (1966-12-01), Blades
patent: 4243071 (1981-01-01), Shackelford
patent: 4554050 (1985-11-01), Minford et al.
patent: 4671852 (1987-06-01), Pyke
patent: 4817652 (1989-04-01), Liu et al.
patent: 4899767 (1990-02-01), McConnell et al.
patent: 5071547 (1991-12-01), Cazer et al.
patent: 5134445 (1992-07-01), Toge
patent: 5254143 (1993-10-01), Anazawa et al.
patent: 5269838 (1993-12-01), Inoue et al.
patent: 5279704 (1994-01-01), Saito
patent: 5302311 (1994-04-01), Sugihara et al.
patent: 5346302 (1994-09-01), Ryu
patent: 5466389 (1995-11-01), Ilardi et al.
patent: 5470461 (1995-11-01), Ban et al.
patent: 5490611 (1996-02-01), Bernosky et al.
patent: 5637151 (1997-06-01), Schulz
patent: 5678116 (1997-10-01), Sugimoto et al.
patent: 5840127 (1998-11-01), Hayashida et al.
patent: 5853491 (1998-12-01), Schulz
patent: 5858106 (1999-01-01), Ohmi et al.
patent: 5882433 (1999-03-01), Ueno
patent: 5885362 (1999-03-01), Morinaga et al.
patent: 5908509 (1999-06-01), Olesen et al.
patent: 5922136 (1999-07-01), Huang
patent: 5938847 (1999-08-01), Akimoto et al.
patent: 5962384 (1999-10-01), Cooper et al.
patent: 5972123 (1999-10-01), Verhaverbeke
patent: 5996595 (1999-12-01), Olesen et al.
patent: 6063695 (2000-05-01), Lin et al.
patent: 6074935 (2000-06-01), Ramachandran
patent: 6132522 (2000-10-01), Verhaverbeke et al.
patent: 6138995 (2000-10-01), Page
patent: 6143706 (2000-11-01), Morinaga et al.
patent: 6152148 (2000-11-01), George et al.
patent: 6158721 (2000-12-01), Katou et al.
patent: 6164632 (2000-12-01), Uchida et al.
patent: 6211055 (2001-04-01), Peng et al.
patent: 6265781 (2001-07-01), Andreas
patent: 6321759 (2001-11-01), Okamura et al.
patent: 6328905 (2001-12-01), Lebowitz et al.
patent: 6454871 (2002-09-01), Labib et al.
patent: 6517637 (2003-02-01), Fu et al.
patent: 6837941 (2005-01-01), Hirooka et al.
patent: 6884634 (2005-04-01), Suzuki et al.
patent: 6927176 (2005-08-01), Verhaverbeke et al.
patent: 7159599 (2007-01-01), Verhaverbeke et al.
patent: 2002/0102852 (2002-08-01), Verhaverbeke et al.
patent: 2003/0045131 (2003-03-01), Verbeke
patent: 2003/0192428 (2003-10-01), Cheng et al.
patent: 2004/0028602 (2004-02-01), Franz et al.
patent: 2004/0063227 (2004-04-01), Tetsuo et al.
patent: 2005/0227888 (2005-10-01), Verhaverbeke et al.
patent: 2006/0260647 (2006-11-01), Verhaverbeke et al.
patent: 2006/0264343 (2006-11-01), Verhaverbeke et al.
patent: 496605 (1992-07-01), None
patent: 560324 (1993-09-01), None
patent: 678571 (1995-10-01), None
patent: 678571 (1997-01-01), None
patent: 789071 (1997-08-01), None
patent: 0860866 (1998-02-01), None
patent: 926714 (1999-06-01), None
patent: 1205968 (2002-05-01), None
patent: 07060082 (1995-03-01), None
patent: WO 98/34579 (1998-08-01), None
patent: WO 02/01609 (2002-01-01), None
Clearly the Standard Online Newsletter, Pall Corporation, Spring/Summer 2000.
Naoaki et al., “Washing Method,” Mar. 17, 1998, Computer-generated English translation of JP 10-071375, 11 pages.
Anderegg, Von G., et al., “Hydroxamatkomplexe III.sup.1). Eisen (III)-Austausch zwischen Sideraminen und Komplexonen Diskussion der Bildungskonstanten der Hydroxamatkomplexe,” Helvetica Chimica Acta, vol. XLVI, Fasciculus IV (1963)—No. 156, pp. 1409-1422, Basel 7 (Schweiz).
Birus, Mladen, et al., “Iron (III) Complexation by Desferrioxamine B in Acidic Aqueous Solutions. Kinetics and Mechanism of the Formation and Hydrolysis of the Binuclear Complex Diferrioxamine B, Inorganic Chemistry,” vol. 23, No. 14, 1984, pp. 2170-2175, © 1984 American Chemistry Society.
Birus, Mladen, et al., “Iron (III) Complexation by Desferrioxamine B in Acidic Aqueous Solutions. The Formation of Binuclear Complex Fiferrioxamine B,” Inorganica Chimica Acta, vol. 78 (B6) N. 2, Feb. 1983, pp. 87-92, ©. Elsevier Sequoia/Printed in Switzerland.
Birus, Mladen, et al., Kinetics and Mechanism of Interactions Between Iron (III) and Desferrioxamine B. The Formation and Hydrolysis of Ferrioxamine B in Acidic Aqueous Solution, Croatica Chemica Acta, CCACAA 56 (1) pp. 61-77, Apr. 2007.
Birus, Mladen, et al., “Kinetics of Stepwise Hydrolysis of Ferrioxamine B and of Formation of Diferrioxamine B in Acid Perchlorate Solution, Inorganic Chemistry,” vol. 26, No. 7, 1987, pp. 1000-1005, © 1987 American Chemical Society.
Birus, Mladen, et al., “Mechanistic and Equilibrium Study of the Iron (III) Complexation by Deferriferrioxamine B in Aqueous Acidic Solution. Evidence for the Formation of Binuclear Diferrioxamine B, Inorganica Chimica Acta,” Bioinorganic Chemistry Articles And Letters, vol. 56(B3), No. 2, Aug. 1981, pp. L43-L44, © Elsevier Sequoia S.A., Lausanne, Printed in Switzerland.
Evers, Ann, et al., “Metal Ion Recognition in Ligands with Negatively Charged Oxygen Donor Groups. Complexation of Fe(III), Ga(III), In(III), Al(III), and Other Highly Charged Metal Ions, Inorganic Chemistry,” vol. 28, No. 11, 1989, pp. 2189-2195, © 1989 American Chemical Society.
Gould, Brian, et al., “A Thermodynamic Description of the Binding of Iron to Ferrioxamine B in Aqueous Solutions, Archives Of Biochemistry And Biophysics,” vol. 215, No. 1, Apr. 1, 1982, pp. 148-156, © 1982 by Academic Press, Inc., A Subsidiary of Harcourt Brace Jovanovich, Publishers, New York, London, Paris, San Diego, San Francisco, Sao Paolo, Sydney, Tokyo, Toronto.
Harju, Leo, “The Stability Constants Of Some Metal Chelates Of Triethylenetetraminehexaacetic Acid (TTHA),” Analytica Chimica Acta, vol. 50, 1970, pp. 475-489, Elsevier Publishing Company, Amsterdam, Printed in The Netherlands.
Harju, Leo, et al., “Titrations With Complexing Agents Forming Mononuclear And Binuclear Complexes With Metals,” Analytica Chimica Acta, vol. 49, 1970, pp. 205-219, Elsevier Publishing Company, Amsterdam, Printed in The Netherlands.
Khan, M.M. Taqui, et al., “Aminopolycarboxylic Acid Complexes of Al(III), Ga(III) & In(III),” Indian Journal of Chemistry, vol. 19A, Jan. 1980, pp. 50-57, published by The Council Of Scientific & Industrial Research, New Delhi, India.
Ma, Rong, et al., “Protonation constants and metal ion binding constants of N,N′,- bis (2-hydroxyphenyl)-N,N′-ethylenediaminediacetic acid,” Inorganica Chimica Acta, The International Inorganic Chemistry Journal, vol. 209, No. 1, 1993, pp. 71-78, .© 1993 Elsevier Sequoia.
Monzyk, Bruce, et al., “Kinetics and Mechanism of the Final Stage of Ferrioxamine B Aquation in Aqueous Acid,” Inorganica Chimica Acta, Bioinorganic Chemistry Articles and Letters, vol. 55 (B2) No. 1 Jan. 1981, pp. L5-L7, © Elsevier Sequoia S.A., Lausanne-Printed in Switzerland.
Monzyk, Bruce, et al., “Kinetics and Mechanism of the Stepwise Dissociation of Iron (III) from Ferrioxamine B in Aqueous Acid,” Journal Of The American Chemical Society, vol. 104, No. 18, 1982, pp. 4921-4929, © 1982 American Chemical Society.
Ohman, Lars-Olof, “Equilibrium and Structural Studies of Silicon (IV) and Aluminum (III) in Aqueous Solution. 21. A Potentiometric and .sup.27 A1 NMR Study of the System H.sup.+−A1.sup.3+−MoO.sub.4.sup.2-,” Inorganic Chemistry, vol. 28, No. 19, 1989, pp. 3629-3632, © American Chemical Society.
Winston, Anthony, et al., “Hydroxamic Acid Polymers. Effect of Str
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Verhaverbeke Steven
Applied Materials Inc.
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Bushey Scott
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