Adhesive bonding and miscellaneous chemical manufacture – Differential fluid etching apparatus – With etchant gas supply or exhaust structure located outside...
Reexamination Certificate
2005-03-15
2005-03-15
Lund, Jeffrie R. (Department: 1763)
Adhesive bonding and miscellaneous chemical manufacture
Differential fluid etching apparatus
With etchant gas supply or exhaust structure located outside...
C118S715000, C118S733000
Reexamination Certificate
active
06866746
ABSTRACT:
Embodiments of the present invention generally relate to a clamshell and small volume chamber with a fixed substrate support. One embodiment of a processing chamber includes a fixed substrate support having a substrate receiving surface, a pumping ring disposed around a perimeter of the substrate receiving surface, and a gas distribution assembly disposed over the fixed substrate support. The pumping ring forms at least a portion of a pumping channel and has one or more apertures formed therethrough. The chamber may further include a gas-flow diffuser disposed radially inward of the apertures of the pumping ring. Another embodiment of a processing chamber includes a first assembly comprising a fixed substrate support and a second assembly comprising a gas distribution assembly. The first assembly includes a first assembly body that is shaped and sized so that at least a portion of the first assembly body is below the substrate receiving surface of the substrate support. A hinge assembly couples the first assembly and the second assembly. The first assembly and the second assembly can be selectively positioned between an open position and a closed position.
REFERENCES:
patent: 3649339 (1972-03-01), Smith
patent: 3973665 (1976-08-01), Giammanco
patent: 4058430 (1977-11-01), Suntola et al.
patent: 4389973 (1983-06-01), Suntola et al.
patent: 4413022 (1983-11-01), Suntola et al.
patent: 4729306 (1988-03-01), Bubley
patent: 4834831 (1989-05-01), Nishizawa et al.
patent: 4993357 (1991-02-01), Scholz
patent: 5225366 (1993-07-01), Yoder
patent: 5281274 (1994-01-01), Yoder
patent: 5294286 (1994-03-01), Nishizawa et al.
patent: 5374570 (1994-12-01), Nasu et al.
patent: 5383971 (1995-01-01), Selbrede
patent: 5441703 (1995-08-01), Jurgensen
patent: 5443647 (1995-08-01), Aucoin et al.
patent: 5480818 (1996-01-01), Matsumoto et al.
patent: 5483919 (1996-01-01), Yokoyama et al.
patent: 5503875 (1996-04-01), Imai et al.
patent: 5582866 (1996-12-01), White
patent: 5611865 (1997-03-01), White et al.
patent: 5674786 (1997-10-01), Turner et al.
patent: 5711811 (1998-01-01), Suntola et al.
patent: 5796116 (1998-08-01), Nakata et al.
patent: 5807792 (1998-09-01), Ilg et al.
patent: 5835677 (1998-11-01), Li et al.
patent: 5855680 (1999-01-01), Soininen et al.
patent: 5879459 (1999-03-01), Gadgil et al.
patent: 5916365 (1999-06-01), Sherman
patent: 6015590 (2000-01-01), Suntola et al.
patent: 6042652 (2000-03-01), Hyun et al.
patent: 6085690 (2000-07-01), Mizuno
patent: 6095083 (2000-08-01), Rice et al.
patent: 6139700 (2000-10-01), Kang et al.
patent: 6174377 (2001-01-01), Doering et al.
patent: 6183563 (2001-02-01), Choi et al.
patent: 6200893 (2001-03-01), Sneh
patent: 6231672 (2001-05-01), Choi et al.
patent: 6270572 (2001-08-01), Kim et al.
patent: 6305314 (2001-10-01), Sneh et al.
patent: 6306216 (2001-10-01), Kim et al.
patent: 6447607 (2002-09-01), Soininen et al.
patent: 6478872 (2002-11-01), Chae et al.
patent: 6481945 (2002-11-01), Hasper et al.
patent: 6511539 (2003-01-01), Raaijmakers
patent: 6551406 (2003-04-01), Kilpi
patent: 20010000866 (2001-05-01), Sneh et al.
patent: 20010009140 (2001-07-01), Bondestam et al.
patent: 20010011526 (2001-08-01), Doering et al.
patent: 20010013312 (2001-08-01), Soininen et al.
patent: 20010014371 (2001-08-01), Kilpi
patent: 20010042523 (2001-11-01), Kesala
patent: 20010042799 (2001-11-01), Kim et al.
patent: 20010054377 (2001-12-01), Lindfors et al.
patent: 20020000196 (2002-01-01), Park
patent: 20020007790 (2002-01-01), Park
patent: 20020041931 (2002-04-01), Suntola et al.
patent: 20020052097 (2002-05-01), Park
patent: 20020086106 (2002-07-01), Park et al.
patent: 20020092471 (2002-07-01), Kang et al.
patent: 20020094689 (2002-07-01), Park
patent: 20020108570 (2002-08-01), Lindfors
patent: 20020134307 (2002-09-01), Choi
patent: 20030004723 (2003-01-01), Chihara
patent: 20030010451 (2003-01-01), Tzu et al.
patent: 20030075273 (2003-04-01), Kilpela et al.
patent: 20030075925 (2003-04-01), Lindfors et al.
patent: 20030116087 (2003-06-01), Nguyen et al.
patent: 20030132319 (2003-07-01), Hytros et al.
patent: 20030172872 (2003-09-01), Thakur et al.
patent: 20030221780 (2003-12-01), Lei et al.
patent: 20040173162 (2004-09-01), Rosenstein et al.
patent: 1167569 (2002-01-01), None
patent: 58-098917 (1983-06-01), None
patent: 05-047666 (1993-02-01), None
patent: 05-206036 (1993-08-01), None
patent: 05-234899 (1993-09-01), None
patent: 04-291916 (1993-10-01), None
patent: 05-270997 (1993-10-01), None
patent: 06-224138 (1994-08-01), None
patent: 2000-319772 (2000-11-01), None
patent: 2001-020075 (2001-01-01), None
patent: 9617107 (1996-06-01), None
patent: 9901595 (1999-01-01), None
patent: 9965064 (1999-12-01), None
patent: 0054320 (2000-09-01), None
patent: 0079576 (2000-12-01), None
patent: 0117692 (2001-03-01), None
patent: 0208488 (2002-01-01), None
Glenn Walter Benjamin
Lei Lawrence C.
Mak Alfred W.
Tepman Avi
Tzu Gwo-Chuan
Applied Materials Inc.
Lund Jeffrie R.
Moser Patterson & Sheridan
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