Chemical vapor deposition chamber

Details Chemical vapor deposition chamber Chemical vapor deposition chamber

1997-09-29

1999-03-16

Breneman, R. Bruce

Coating apparatus

Gas or vapor deposition

Work support

118728, 118725, 118500, C23C 1600

Patent

active

058824197

ABSTRACT:
An improved deposition chamber deposits useful layers on substrates. The improved chamber includes a substrate edge protection system which, in combination with a purge gas, protects selected portions of the edge and underside of the substrate from the deposition gas while preventing the creation of a masked area on the substrate edge. The substrate is supported on a solid receiving plate, and a positioning assembly aligns the substrate to the receiving plate. In some embodiments, the invention may include a stem interconnected to the substrate, a heat limiting member disposed about the stem, and a shroud extending about the stem.

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