Chemical consolidation of photoresists in the UV range

Details Chemical consolidation of photoresists in the UV range Chemical consolidation of photoresists in the UV range

2006-06-27

2006-06-27

Huff, Mark F. (Department: 1756)

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Electron beam imaging

C430S311000, C430S330000, C430S331000, C430S270100

Reexamination Certificate

active

07067234

ABSTRACT:
Structured resists are consolidated, that is post-exposure amplified. The amplifying agent used is a compound which contains at least one bicyclic or polycyclic group. The amplifying agent is attached via a reactive group to a reactive anchor group of a polymer that is used for the resist. The process is particularly suitable for amplifying copolymers of cycloolefins and maleic anhydride.

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Grant & Hackh, Chemical Dictionary, 1987, McGraw-Hill, Inc., 5th Edition, p. 22.

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