Charged beam apparatus

Radiant energy – Inspection of solids or liquids by charged particles – Positive ion probe or microscope type

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25049221, H01J 3730

Patent

active

055919707

ABSTRACT:
A charged beam apparatus of this invention comprises a sample table on which a sample is placed, a column for irradiating a charged beam on a surface of the sample, a gas supply mechanism having a gas supply opening for injecting a gas to an irradiated position of the charged beam, and a driving mechanism for moving the gas supply opening parallel to the surface of the sample in order to position the gas supply opening, and moving the gas supply opening perpendicularly to the surface of the sample in order to set a distance from the gas supply opening to a processing position. This allows the gas pressure to be stably held with a high accuracy at the processing position. Accordingly, desired deposition or etching can be performed with a high accuracy, and this further improves the quality of the mask.

REFERENCES:
patent: 4851097 (1989-07-01), Hattori et al.
patent: 4976843 (1990-12-01), Ward et al.
patent: 5055696 (1991-10-01), Haraichi et al.
patent: 5086230 (1992-02-01), Adachi et al.
patent: 5149974 (1992-09-01), Kirch et al.
patent: 5273849 (1993-12-01), Harriott et al.
patent: 5342448 (1994-08-01), Hamamura et al.
Focused Ion Beam Fabrication of Submicron Gold Structures, Journal of Vacuum Science and Technology, B7(4), Patricia G. Blauner et al., Jul./Aug., 1989, pp. 609-617.

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